ISO 10303-214:2010(E)

Figure — Arrowleft Figure — Clause 4 Figure — Arrowright

4.2.243 General_pattern

A General_pattern is a pattern that specifies a base component and a set of arbitrary placements to arrange identical copies of the base feature. The Axis_placement referenced by the inherited attribute 'location_and_orientation' shall coincide with the Axis_placement of the base feature.

EXAMPLE Figure 38 depicts a General_pattern with one base feature and 5 added instances.

A General_pattern is a type of Replicate_feature.

The data associated with a General_pattern are the following:

added_instance

The added_instance specifies the set of Axis_placement objects that represent the locations and orientations of the additional instances of the base feature in the General_pattern

NOTE The base feature is the first instance in the pattern. In order to form a pattern, one or more additional instances have to be specified.

The placement of the additional instances is performed by matching either the Axis_placement that serves as location for the Feature_definition of the base feature (in the case of an Included_feature) or its local coordinate system (in the case of a Placed_feature) with the Axis_placement objects that identify the additional instances.

The Axis_placement objects are defined in the same Cartesian_coordinate_space as the General_pattern.

See general_pattern to axis_placement for the application assertion.



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